1. S. Günther, A. Hitzke, and R.J. Behm
   Low adatom mobility on the (1x2) missing row reconstructed Au(110) surface
   Surf. Rev. Lett. 6, 1103-1108 (1997).
2. M. Kahlich, M.M. Schubert, M. Hüttner, M. Noeske, H.A. Gasteiger, and R.J. Behm
   Kinetics of the selective CO oxidation in H2-rich gas on supported noble metal catalysts
   "New Materials for Fuel Cell Systems II", Proc. II Internat. Symp. on New Materials for Fuel Cell and Modern Battery Systems,O. Savodogo and P.R.Roberge, eds. (École Polytechnique, Montréal, 1997), 642-653.
3. J. Scherer, F.A. Möller, O.M. Magnussen, and R.J. Behm:
   Corrosion of alkanethiol-modified Cu(100) surfaces in hydrochloric acid solution studied by in-situ STM
   Langmuir 13, 7045-7051 (1997).
4. O.M. Magnussen, F.A. Möller, A. Lachenwitzer, and R.J. Behm
   In-situ STM studies on the electrodeposition of ultrathin Ni films
   in 'Electrochemical Synthesis and Modification of Materials', Mat. Res. Soc. Sym. Proc. 451, 43-48 (1997).
5. F.A. Möller, J. Kintrup, A. Lachenwitzer, O.M. Magnussen, and R.J. Behm
   In-situ STM study of the electrodeposition and anodic dissolution of ultrathin, epitaxial Ni films on Au(111)
   Phys. Rev. B 56, 12506-12518 (1997).
6. A. Hitzke, M. Hugenschmidt, and R.J. Behm:
   Low temperature Ni atom adsorption on the Au(110)-(1x2) surface
   Surf. Sci.389, 8-18 (1997).
7. M.B. Hugenschmidt, M. Ruff, A. Hitzke, and R.J. Behm
   Rotational epitaxy versus missing row reconstruction: Au/Cu/Au(110)
   Surf. Sci. 388, L1100-L1106 (1997).
8. M. Schubert, H.A. Gasteiger, and R.J. Behm
   Formate production as a side product in the selective CO oxidation in H2-rich gas on Pt/Al2O3
   J. Catal. 172, 256-258 (1997).
9. M. Kahlich, H.A. Gasteiger, and R.J. Behm
   Kinetics of the selective CO oxidation in H2-rich gas on Pt/Al2O3
   J. Catal. 171, 93-105 (1997).
10. B. Gleich, M. Ruff, and R.J. Behm
    Correlation between local substrate structure and local chemical properties: CO adsorption on well defined bimetallic Au/Pd(111) surfaces
    Surf. Sci. 386, 48-55 (1997).
11. M. Fehrenbacher, H. Rauscher, U. Memmert, and R.J. Behm
    SiH 4 chemical vapor deposition on Si(111)-(7x7) studied by STM
    Surf. Sci. 385, 123-145(1997).
12. H. Rauscher, F. Behrendt, and R.J. Behm:
    Fabrication of surface nanostructures by STM induced decomposition of SiH4 and SiH2Cl2
    J. Vac. Sci. Technol. B 15, 1373-1377 (1997).
13. A. Lachenwitzer, M.R. Vogt, O.M. Magnussen, and R.J. Behm
    Electrodeposition of Ni on Cu(100): An in-situ STM study
    Surf. Sci. 382, 107-115 (1997).
14. H.-G. Keck, E. Kopatzki and R.J. Behm:
    Improved design for an aluminum evaporator
    J. Vac. Sci. Technol. A 15, 2452-2454 (1997).
15. J. Spatz, M. Möller, M. Noeske, R.J. Behm, and M. Pietralla
    Nano mosaic surfaces by lateral phase separation of a diblock copolymer
    Macromolecules 30, 3874-3880 (1997).
16. M. Pitter, M.B. Hugenschmidt, and R.J. Behm
    The nickel/diamond (100)-(2x1)H interface studied with electron spectroscopy
    Jpn. J. Appl. Phys. 36, 3635-3638 (1997).
17. M. Fehrenbacher, J. Spitzmüller, M. Pitter, H. Rauscher, and R.J. Behm
    Structures on Si(100)-(2x1) at the initial stages of homoepitaxy by SiH4 decomposition
    Jpn. J. Appl. Phys. 36, 3804-3809 (1997).
18. J. Spitzmüller, M. Fehrenbacher, H. Rauscher, and R.J. Behm:
    Tetramer formation on Si(100)-(2x1)
    Surf. Sci. 377-379, 1001-1005 (1997).
19. M.R. Vogt, W. Polewska, O.M. Magnussen, and R.J. Behm
    In-situ STM study of Cu(100) electrodes in sulfuric acid solution in the presence of benzotriazole: Adsorption, Cu corrosion and Cu deposition
    J. Electrochem. Soc. 144, L113-L116 (1997).
20. T.J. Schmidt, M. Noeske, H.A. Gasteiger R.J. Behm, P. Britz, W. Brijoux, and H. Bönnemann
    Electrocatalytic activity of PtRu alloy colloids for the electrooxidation of CO and CO/H2 mixtures: Stripping voltammetry and rotating disk measurements
    Langmuir 13, 2591-2595 (1997).
21. J. Spitzmüller, M. Fehrenbacher, M. Pitter, H. Rauscher, and R.J. Behm
    Local arrangement of silylene groups on Si(100)-(2x1) after SiH4 decomposition
    Phys. Rev. B 55, 4659-4664 (1997).
22. M. Fehrenbacher, H. Rauscher, and R.J. Behm
    Dissociative adsorption of SiH2Cl2 on Si(111)-(7x7)
    Z. Phys. Chem. 198, 205-220 (1997).