Publications 1998
- H. Rauscher and R.J. Behm
Growth structures of silicon homoepitaxy by chemical vapor deposition in 'Morphological organizations in epitaxial growth and removal'
Series on Directions in Condensed Matter Physics, Vol. 14', Z. Zhang and M.G. Lagally eds. (World Scientific, Singapore, 1998), p. 242-261. - F.A. Möller, O.M. Magnussen, and R.J. Behm
Electrodeposition and anodic dissolution of Ni on Au(100): An in-situ STM study
Z. Phys. Chem. 208, 57-75 (1998). - J. Braun, H. Rauscher, and R.J. Behm
Adsorption of disilane on Si(111)-(7x7) and initial stages of CVD growth
Surf. Sci. 416, 226-239 (1998). - F. Buatier de Mongeot, M. Scherer, E. Kopatzki, and R.J. Behm
CO adsorption and oxidation on well defined bimetallic Pt/Ru(0001) surfaces - a combined TDS and STM study
Surf. Sci. 411, 249-262 (1998). - J. Braun, H. Rauscher, and R.J. Behm
Comment on "STM study of low pressure adsorption of silane on Si(111) 7x7' by D. Albertini, F. Thibaudau, L. Masson and F. Salvan
Surf. Sci. 409, L715-L717 (1998). - M.R. Vogt, R.J. Nichols, O.M. Magnussen, and R.J. Behm
Benzotriazole adsorption and inhibition of Cu(100) corrosion in HCl: A combined in-situ STM and FTIR spectroscopy study
J. Phys. Chem. 102, 5859-5865 (1998). - T.J. Schmidt, H.A. Gasteiger, G. Stäb, P. Urban, D.M. Kolb, and R.J. Behm
Characterization of high-surface area electrocatalysts using a rotating disk electrode configuration
J. Electrochem. Soc. 145, 2354-2358 (1998). - O.M. Magnussen, M.R. Vogt, J. Scherer, A. Lachenwitzer, and R.J. Behm
Mikroskopische Untersuchungen der Metallkorrosion in sauren Lösungen auf atomarem Maßstab
Werkstoffe und Korrosion 49, 169-174 (1998). - M. Kahlich, H.A. Gasteiger, and R.J. Behm
Preferential Oxidation of CO over Pt/?-Al2O3 and Au/?-Fe2O3: Reactor design calculations and experimental results
J. New Mat. Electrochem. Syst. 1, 39-46 (1998). - T.J. Schmidt, M. Noeske, H.A. Gasteiger, R.J.Behm, P. Britz, W. Brijoux, and H. Bönnemann
PtRu alloy colloids as precursors for fuel cell catalysts: A combined XPS, AFM, HRTEM and RDE study
J. Electrochem. Soc. 145 , 925-931 (1998). - J. Spitzmüller, M. Fehrenbacher, F. Haug, H. Rauscher, and R.J. Behm
The role of antiphase domain boundaries in Si epitaxy by chemical vapor deposition from SiH4 or SiH2Cl2 on Si(100)-(2x1)
Appl. Phys. A 66, S1025-S1029 (1998). - J. Spitzmüller, J. Braun, H. Rauscher, and R.J. Behm
Thermal decomposition of tetraethoxysilane (TEOS) on Si(111)-(7x7)
Appl. Phys. A 66, S1021-S1024 (1998). - M. Ruff, B. Gleich, and R.J. Behm
Au step atoms as active sites for CO adsorption on Au and bimetallic Au/Pd(111) surfaces
Appl. Phys. A 66, S513-S517 (1998). - O.M. Magnussen, M.R. Vogt, J. Scherer, and R.J. Behm
Double layer structure, corrosion, and corrosion inhibition of copper in aqueous solution
Appl. Phys. A 66, S447-S451 (1998). - R.J. Behm
Spatially resolved chemistry on bimetallic surfaces
Acta Phys. Pol. A 93, 259-272 (1998). - H.A. van der Vegt, J.A. Meyer, J. Vrijmoeth, R.J. Behm, and E. Vlieg
Sb enhanced nucleation in the homoepitaxial growth of Ag(111)
Phys. Rev. B 57, 4127-4131 (1998). - M.C. Bartelt, S. Günther, E. Kopatzki, R.J. Behm, and J.W. Evans
Island-size distributions in submonolayer epitaxial growth: Influence of the mobility of small clusters
Phys. Rev. B 53 4099-4104 (1998). - O.M. Magnussen, F.A. Möller, M. Vogt, and R.J. Behm
Nucleation and growth at metal electrode surfaces
in 'Electrochemical Nanotechnology', W. Lorenz and W. Plieth eds. (Wiley-VCH, Wein-heim, 1998), p.159-170. - J. Spitzmüller, J. Braun, H. Rauscher, and R.J. Behm
Dissociative adsorption and site specifity in the initial stages of tetraethoxysilane (TEOS) interaction with Si(111)-(7x7)
Surf. Sci. 400, 356-366 (1998). - M.R. Vogt, A. Lachenwitzer, O.M. Magnussen, and R.J. Behm
In-situ STM study on the initial stages of corrosion of Cu(100) electrodes in sulfuric and hydrochloric acid solution
Surf. Sci. 399, 39-80 (1998). - J. Trost, H. Brune, J. Wintterlin, R.J. Behm, and G. Ertl
Interaction of oxygen with Al(111) at elevated temperatures
J. Chem. Phys. 108, 1740-1747 (1998). - R. Houbertz, U Memmert, and R.J. Behm:
On the potential dependent etching of Si(111) in aqueous NH4F solution
Surf. Sci. 396, 198-211 (1998).