The Core Facility EMMA operates two high resolution dual-beam microscopes – a Helios NanoLab 600 and a Quanta 3D FEG (FEI-Thermo Fisher). Both systems are equipped with an electron field emission gun (FEG) for high-resolution imaging and a Gallium focused ion beam (FIB) for local sample manipulation at the nanometer scale. The combination of a scanning electron microscope (SEM) and an FIB column in one instrument offers the possibility of investigating and preparing samples in unique ways, including 3-D analyses via cross-sectioning, whole sample volumes analysis via FIB/SEM tomography, element deposition (ex. platinum and carbon) via ion and electron beam-induced deposition (IBID and EBID), and TEM sample preparation.
In addition to surface manipulation and imaging, we are also able to study the surface composition of materials and analyze crystalline samples using energy dispersive x-ray spectroscopy (EDX) and electron backscatter diffraction (EBSD). For further information regarding the FIB-SEM systems and our capabilities, please see the sections below or contact us directly.
Instruments
FEI Quanta 3D FEG (N25/1508)
Stage
- x,y: 50 mm
- z: 25 mm
Focused Ion Beam Column, FIB
- Liquid Ga ion source
- Resolution: 7 nm @ 30 kV
- Beam Current: 1.5 pA -65 nA in 15 steps
High-Resolution Field Emission SEM Column
- Schottky field emitter
- Resolution:
- High vacuum: 1.2 nm at 30 kV (SE)
- Low vacuum: 1.5 nm at 30 kV (SE)
- ESEM: 1.5 nm at 30 kV (SE)
Beam Chemistry
- Pt, SiO2 Deposition
- Insulator Enhanced etch (IEE) XeF2
Detectors
- ETD - Everhart-Thornley Detector (photomultiplier)
- GSED - Gaseous Secondary Electron Detector (Environmental SEM Mode)
- EDX - Energy Dispersive X-ray Detector (EDAX SDD Apollo XV)
- EBSD - Electron Backscattering Diffraction (EDAX DigiView 4 EBSD Detektor)
Additional Capabilities
- Auto Slice and View™
- SEM Imaging
- FIB Milling
- Qualitative and Quantitative Composition Analysis (EDX)
- Analysis of Crystalline Samples using EBSD
- 3D-orientation of the crystal lattice at each analysis point
- Environmental SEM (ESEM)
Helios Nanolab 600 (N25/1508)
Piezo-controlled stage
- x,y: 150 mm, z: 10 mm
- 6 inch wafer holder
Focused Ion Beam Column, FIB (Sidewinder™ column)
- Liquid Ga ion source
- Resolution: 5 nm (@ 30 kV)
High-Resolution Field Emission SEM Column
- Schottky field emitter
- Resolution: 0.9 nm @ 15 kV
Detectors
- CDEM - Continuos Dynonde Electron Multiplier
- ETD - Everhart-Thornley Detector (photomultiplier)
- TLD - Through-Lens Detector photomultiplier
Beam Chemistry
- Pt deposition
- Insulator Enhanced etch, IEE (XeF2)
- Selective Carbon Mill, SCE
Additional Equipment/Software
- Omniprobe
- Quorum Cryosystem
- AutoTEM ™
- Nanobuilder
- SEM Imaging
- Prototyping of Complex Structures
- Ion and electron beam-induced deposition (IBID and EBID)
- Gas-mediated Etching
- TEM sample preparation