Equipment

Epitaxy

MBE: 2 x Riber32

MOVPE: 2 x Aixtron

HVPE: Aixtron

Lithography

Electron beam lithography: Leica EBPG 5 HR

Maskaligner: 2 x Süss MJB3, 1X Süss MJB4

Flood exposure: OAI DUV

Etching

Barreletch: Plasmalab µ-etch

ECR: Oxford 80

ICP: Oxford 100

Vapour Deposition

Temescal FC 1800

Balzers PLS 570

Leybold QE 1200

Leybold

Edwards 306 Cryo

Sputtering

Perkin Elmer 2400

Baltec SCD 050

PECVD

Oxford Plasma Technology

Characterization

Needle Probe Süss PM5

Ellipsometer Gärtner

Magnetoresistant Tencor m-gage

Surface profil: 1 x Tencor AlphaStep, 1 x Bruker Dektak

Microscopes: Reichert Jung Polyvar, Nikon Mikrophot FXA, Leica M32

Confocal microscope: Keyence

REM: Hitachi S4000, Hitachi S5000

X-ray diffractometer: Siemens HXRD D5000, Bruker

Other

Rapid Thermal Annealing AST